Computational Lithography
Optical Proximity Correction (OPC) Benchmarks
Accelerating semiconductor manufacturing through high-fidelity lithography simulation and generative correction models. Compare state-of-the-art architectures on standardized industrial datasets.
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GAN Transformer Physics-ML U-Net++
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| Rank | Model | Author / Lab | EPE (nm) | PV Band (nm²) | Inference (ms) | Date |
|---|---|---|---|---|---|---|
| workspace_premium 01 | DeepOPC-Gen3 PHYSICS-INFORMED DIFFUSION | Stanford NanoFab / TSMC Research | 0.422 | 12.84 | 42.5 | Oct 12, 2024 |
| workspace_premium 02 | LithoVision-ViT VISION TRANSFORMER | IMEC / KU Leuven | 0.431 | 13.10 | 38.2 | Oct 05, 2024 |
| workspace_premium 03 | OptiBeam Net REINFORCEMENT LEARNING | Tsinghua Univ / SMIC | 0.445 | 13.55 | 56.1 | Sep 28, 2024 |
| 04 | FastOPC++ CNN ACCELERATED | Cadence Research Lab | 0.458 | 14.02 | 15.4 | Sep 20, 2024 |
| 05 | WaveNet Litho WAVELET TRANSFORM | Siemens EDA / Mentor | 0.462 | 14.15 | 22.9 | Sep 15, 2024 |
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